AVS 60th International Symposium and Exhibition
    Plasma Science and Technology Tuesday Sessions

Session PS1-TuA
Plasma Diagnostics, Sensors and Control

Tuesday, October 29, 2013, 2:00 pm, Room 102 B
Moderator: N.St.J. Braithwaite, The Open University, UK


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS1-TuA1
Real Time Feedback Control of Photoresist ashing in an Electron Cyclotron Resonance Plasma Chamber
B.J. Keville, C. Gaman, Y. Zhang, A.M. Holohan, S. Daniels, M.M. Turner, Dublin City University, Ireland
2:20pm PS1-TuA2
Diagnostics of Inductively-Coupled Plasmas in Hydrogen Bromide : Bromine Atom and Electron Densities
J.-P. Booth, N. Sirse, P. Chabert, M. Foucher, LPP-CNRS, Ecole Polytechnique, France
2:40pm PS1-TuA3 Invited Paper
Ion Energy Distribution Measurements at the Substrate Location in Continuous-wave and Pulse Modulated Plasmas
D. Gahan, P. Scullin, D. O'Sullivan, M.B. Hopkins, Impedans Ltd., Ireland
4:00pm PS1-TuA7 Invited Paper
Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes
G. Cunge, M. Brihoum, M. Darnon, E. Despiau-Pujo, A. Davydova, M. Haass, R. Blanc, Cnrs/ujf/ Cea - Ltm, France, N.St.J. Braithwaite, The Open University, UK, D. Gahan, Impedans Ltd, Ireland, S. Banna, AMAT, O. Joubert, N. Sadeghi, Cnrs/ujf/ Cea - Ltm, France
4:40pm PS1-TuA9
Optical Emission and Langmuir Probe Diagnostics of CH3F-O2 Inductively Coupled Plasmas
E. Karakas, V.M. Donnelly, D.J. Economou, University of Houston
5:00pm PS1-TuA10
Non-contact Measurements of Substrate-Temperature by Frequency-Domain Low-Coherence Interferometry
T. Tsutsumi, Nagoya University, Japan, T. Ohta, Meijo University, Japan, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, Nagoya University, Japan, M. Ito, Meijo University, Japan
5:20pm PS1-TuA11
Detection of Vacuum Ultraviolet in Argon-containing Inductively Coupled Plasmas
S.B. Radovanov, Varian Semiconductor Equipment, Silicon Systems Group, Applied Materials Inc., H.M. Persing, Applied Materials Inc. Varian Semiconductor Equipment, Silicon Systems Group, Applied Materials Inc., J.B. Boffard, C.L. Culver, S. Wang, C.C. Lin, A.E. Wendt, University of Wisconsin-Madison
5:40pm PS1-TuA12
Time-resolved In Situ Quantum Cascade Laser Diagnostics Applied to Transient Molecular Plasmas
S. Welzel, Eindhoven University of Technology, Netherlands, F. Brehmer, Eindhoven University of Technology, Netherlands; AFS GmbH, Germany, M.C.M. van de Sanden, Eindhoven University of Technology; DIFFER, Netherlands, R. Engeln, Eindhoven University of Technology, Netherlands