| AVS 60th International Symposium and Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS-WeA1 Invited Paper The Origins of the AVS Plasma Science and Technology Division H.F. Dylla, American Institute of Physics |
| 2:40pm | PS-WeA3 Invited Paper The Emergence of Plasma Processing M.A. Lieberman, University of California, Berkeley |
| 4:00pm | PS-WeA7 Invited Paper The Virtual World of Modeling Plasma Processing M.J. Kushner, University of Michigan |
| 4:40pm | PS-WeA9 Invited Paper Innovations in Diagnsotics for Non-Thermal Plasma N.St.J. Braithwaite, The Open University, UK |
| 5:20pm | PS-WeA11 Invited Paper Plasma Surface Interactions and How They Limit Semiconductor Plasma Processing R.A. Gottscho, K.J. Kanarik, S. Sriraman, Lam Research Corp |