AVS 60th International Symposium and Exhibition | |
Thin Film | Thursday Sessions |
Session TF-ThA |
Session: | Energetic Thin Films |
Presenter: | C. Rebholz, University of Cyprus |
Authors: | C. Rebholz, University of Cyprus I.E. Gunduz, Northeastern University K. Fadenberger, University of Cyprus K. Woll, Johns Hopkins University C.C. Doumanidis, University of Cyprus |
Correspondent: | Click to Email |
Reactive nanoscale multilayer films/foils represent a relatively new class of materials which have recently received considerable attention for use in joining applications. However, due to the fast reaction rates in these foils (between 1 and ~ 20 m/s for the Ni/Al system) much of the understanding of the reactions is derived from comparing before and after states of the samples.
In this work, reaction characteristics of nanoscale multilayer foils of Nickel (Ni) and Aluminum (Al) and Ruthenium (Ru) and Al were investigated using a numerical model based on sequential diffusion limited growth with diffusivity values obtained from previous diffusion experiments. The model makes use of percentages of each phase that can exist at each grid point, which simplifies the enthalpy calculations and incorporation of phase changes. Obtained results show excellent agreement with measured velocity values, observed in-situ morphology of the thermal fronts and temperatures for both Ni/Al and Ru/Al multilayer foils, obtained using high-speed optical camera and infrared thermometry in combination with fast high resolution in-situ XRD.