AVS 60th International Symposium and Exhibition | |
Thin Film | Wednesday Sessions |
Session TF+VT-WeM |
Session: | Thin Film Permeation Barriers and Encapsulation |
Presenter: | J. Rowley, Brigham Young University |
Authors: | J. Rowley, Brigham Young University R.C. Davis, Brigham Young University L. Pei, Brigham Young University R.R. Vanfleet, Brigham Young University S. Liddiard, MOXTEK Incorporated M. Harker, MOXTEK Incorporated J. Abbott, MOXTEK Incorporated |
Correspondent: | Click to Email |
A low stress, flexible hydrogenated sp2 carbon film(a-C:H) was developed using reactive sputtering of a graphite target in an ethylene/argon gas mixture. This resulted in a corrosion resistant layer. The carbon film was characterized by a series of techniques including Raman, EELS, AFM, XPS, and CHN analysis. An ethylene to argon gas ratio of 0.1 resulted in a film with 83.9% carbon, 5.0% hydrogen and 10.6% oxygen by weight fraction. This corresponds to a mole fraction of hydrogen to carbon of 4:6, a large hydrogen fraction. The films are dominantly sp2 as seen by Raman and EELS. Bulge testing determined a low elastic modulus and strength. The 4:6 a-C:H, 100 micron films showed a stress of 200 MPa(compressive) which is much lower than what has been reported previously for sputtered carbon films.