Invited Paper TC+EM+TF-WeM5
Processing Water-based TFT Materials
Wednesday, October 30, 2013, 9:20 am, Room 102 B
High-quality semiconductor and dielectric films can readily be deposited from aqueous solutions containing polynuclear metal nonoclusters. To support the continued development of the films and their use, new techniques have been developed to remove residual mobile ions associated with hydroxide. Examples of incorporation of the resulting films into TFTs and MIM devices will be described.