| AVS 60th International Symposium and Exhibition | |
| Advanced Surface Engineering | Wednesday Sessions |
| Session SE+PS-WeA |
| Session: | Atmospheric Pressure Plasmas |
| Presenter: | Y.L. Wu, University of Illinois at Urbana Champaign |
| Authors: | Y.L. Wu, University of Illinois at Urbana Champaign J. Hong, University of Illinois at Urbana Champaign D. Peterson, University of Illinois at Urbana Champaign J. Zhou, University of Illinois at Urbana Champaign T.S. Cho, University of Illinois at Urbana Champaign D.N. Ruzic, University of Illinois at Urbana Champaign |
| Correspondent: | Click to Email |
Recently, the Center for Plasma-Material Interaction (CPMI) has developed innovative coating method of Evaporative Coating at Atmospheric Pressure (ECAP). This new idea is an atmospheric pressure based process Following the similar concept as the Laser Pressure LAPCAP purely at Atmospheric Pressure (LAPCAP) [1], the material captured by the plasma plume is atomic in nature (the evaporated metal atom) and should therefore end up deposited molecule-by-molecule a s in a PVD fashion By using the thermal energy from the microwave plasma solid 99.99%+ purity aluminum are evaporated and then produce a PVD-like alumina coating on a workpiece. The Aluminum target is inserted in the center of the microwave torch feeding a melt pool and evaporates into the surrounding plasma plume . A bottle neck was made in the antenna and could reduce the heat loss by 84%. The film was deposited a s Al2O3 using oxygen from the environment. Alpha and other metastable phases of aluminum oxide were found on the deposited films. Deposition rate was around 2um/min. Gas flow rate around the antenna tip was about 0.9 m/s, and temperature of the plasma was about 1400°C at 1350W input power from simulations. Gas shield was used to keep the work gas pure. A much higher thermal energy of the plasma plume will make a superior coating microstructure as compared to a purely evaporated film.
Reference:
[1] Laser-assisted plasma coating at atmospheric pressure: production of yttria-stabilized zirconia thermal barriers, Zihao Ouyang et al 2011 J. Phys. D: Appl. Phys. 44 265202