AVS 60th International Symposium and Exhibition | |
Advanced Surface Engineering | Thursday Sessions |
Session SE+NS+TF-ThA |
Session: | Nanostructured Thin Films and Coatings |
Presenter: | P. Schaaf, TU Ilmenau, Germany |
Authors: | P. Schaaf, TU Ilmenau, Germany D. Wang, TU Ilmenau, Germany Y. Yan, TU Ilmenau, Germany A. Herz, TU Ilmenau, Germany |
Correspondent: | Click to Email |
Ordered arrays of single crystalline nanoporous Si nanopillars are fabricated by a combination of nanoimprint lithography and metal-assisted chemical etching. The pillar structure is first defined on the Si wafer via nanoimprint lithography, and then a thin Au film is deposited on the wafer. The metal-assisted chemical etching is performed in a solution consisting of HF and H2O2, and the Au film acts as catalyst for the etching process. The etching process with highly doped p-type Si leads to the formation of porous pillars. By combining a further process step of biomimetic synthesis, porous Si/TiO2 core/shell nanocomposite pillars are successfully produced. Besides, the TiO2 is N-doped and also partially filled in the porous Si core.