Invited Paper MS+AS+EM+EN+NS+TF-MoM5
Conformal Thin Films- The Use of Atomic Layer Deposition in Energy Related Applications
Monday, October 28, 2013, 9:40 am, Room 202 B
Atomic Layer Deposition (ALD) is a unique thin film deposition technique based on sequential precursor usage with self-limiting reactions, which yields films with excellent uniformity, density, conformality, and interface quality . This is turn has set the stage for its use in a wide array of technology areas. In this work, the principles of ALD will be covered, along with an examination of the intersection points between ALD and a number energy related structures - including storage devices.