AVS 60th International Symposium and Exhibition | |
Helium Ion Microscopy Focus Topic | Thursday Sessions |
Session HI-ThA |
Session: | Imaging and Lithography with Helium Ions |
Presenter: | H.X. Guo, National Institute for Materials Science, Japan |
Authors: | H.X. Guo, National Institute for Materials Science, Japan J.H. Gao, National Institute for Materials Science, Japan D. Fujita, National Institute for Materials Science, Japan |
Correspondent: | Click to Email |
Two dimension(2D) materials, such as graphene or hexagonal boron nitride (h-BN), have layer structures which are different from bulk materials [1]. Normally, different layers of the 2D materials were combined by a weak band compared with the interlayer chemical bands. This makes the 2D materials special in physical and chemical properties such as optical properties or band structures. Many methods have been applied to research 2D materials, such as Raman microscopy, scanning probe microscopy, transmission electron microscopy and others.
In this presentation, we will show our investigation of 2D materials with scanning helium ion microscopy(SHIM) and other methods. The BN nano sheets and quasi-free standing graphene were synthesized by BN and carbon segregation on surface of metallic substrate [2]. We characterized the number and morphology of the h-BN by using scanning electron microscopy(SEM) and SHIM. On the basis of the interaction between the scanning particles (electrons and helium ions) and h-BN nanosheets, we interpreted an exponential relationship between the intensities of images and the number of layers. Inelastic mean free paths (IMFP) of electrons and helium ions in h-BN nano sheets were calculated approximately. The quasi-free standing graphene on metallic substrate was characterized by scanning kelvin probe microscopy, scanning Auger microscopy, SEM and SHIM. The SHIM images of such samples show high surface sensitivity and space resolution. The advantage of different characterization were interpreted in this presentation.
[1] Mingsheng Xu, Tao Liang, Minmin Shi, and Hongzheng Chen, Chem. Rev, DOI: 10.1021/cr300263a.
[2] Mingsheng Xu, Daisuke Fujita, Hongzheng Chen, and Nobutaka Hanagata, Nanoscale, 3, 2854(2011)