| AVS 60th International Symposium and Exhibition | |
| Applied Surface Science | Thursday Sessions |
| Session AS-ThP |
| Session: | Applied Surface Science Poster Session |
| Presenter: | K.D. Bomben, Physical Electronics Inc. |
| Authors: | K.D. Bomben, Physical Electronics Inc. J.S. Hammond, Physical Electronics Inc. J.F. Moulder, Physical Electronics Inc. S.S. Alnabulsi, Physical Electronics Inc. S.N. Raman, Physical Electronics Inc. N.C. Erickson, University of Minnesota R.J. Holmes, University of Minnesota |
| Correspondent: | Click to Email |
Cluster ion beam technologies, in particular the use of C60 and Ar gas cluster ion beams (GCIB), are increasingly being used for the depth characterization of organic materials to provide information that is not available from monatomic ion beams such as Ar+. For surface analysis applications, these cluster sources are used for a wide range of organic materials, including multi-layer organic thin films and organic light emitting diodes (OLEDs), including metal capped devices.
Improvements in the efficiencies for OLED structures have recently focused on the incorporation of more effective organic materials and the on the development of novel structures for arranging these organic materials. Multi-layer devices, graded composition devices, and novel electrical contact layers to the organic materials are all being rapidly developed. The need for analytical techniques that allow the elucidation of the organic thin film structure as a function of device fabrication and lifetime studies is extremely important.
In combination with GCIB sputtering, XPS and TOF-SIMS are being used for quantitative chemical as well as molecular depth profiling techniques for OLED structures. The ability to accurately identify the chemistry at an interface using a co-sputtering protocol involving conventional argon ions and an argon cluster will be discussed. Quantitative compositional depth profiling of graded composition multilayer OLED films and other OPV devices will be demonstrated.