AVS 59th Annual International Symposium and Exhibition
    Thin Film Thursday Sessions

Session TF+EM+SE+NS-ThM
Nanostructuring Thin Films

Thursday, November 1, 2012, 8:00 am, Room 10
Moderator: R.C. Davis, Brigham Young University


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF+EM+SE+NS-ThM1 Invited Paper
Plasma Effects in Nanostructuring Thin Films
K. Ostrikov, CSIRO Materials Science and Engineering, Australia
8:40am TF+EM+SE+NS-ThM3
Directed, Liquid Phase Assembly of Patterned Metallic Films by Pulsed Laser Dewetting
Y. Wu, University of Tennessee, J.D. Fowlkes, M. Fuentes-Cabrera, Oak Ridge National Laboratory, N.A. Roberts, P.D. Rack, University of Tennessee
9:00am TF+EM+SE+NS-ThM4
Nanosphere Lithography for Bit Patterned Media
A.G. Owen, H. Su, A.M. Montgomery, S.M. Kornegay, S. Gupta, University of Alabama
9:20am TF+EM+SE+NS-ThM5
Effects of Nanometer Scale Periodicity on the Self-Propagating Reaction Behaviors of Sputter-Deposited Multilayers
D. Adams, R. Reeves, Sandia National Laboratories
9:40am TF+EM+SE+NS-ThM6
Ag Nanoparticles Supported by (111) Facets on Biaxial CaF2 Nanoblades
M. Auer, D. Ye, Virginia Commonwealth University