| AVS 58th Annual International Symposium and Exhibition | |
| Thin Film Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-TuA1 Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water J.A. Libera, J.N. Hryn, Jeffrey Elam, Argonne National Laboratory |
| 2:20pm | TF-TuA2 Engineering AlN Thin Films by Atomic Layer Deposition on Wide Bandgap Semiconductors as Gate Dielectric Ya-Chuan Perng, J.P. Chang, University of California Los Angeles |
| 2:40pm | TF-TuA3 Invited Paper Paul Holloway Award Lecture - Gas-Surface Interactions during Atomic Layer Deposition Sumit Agarwal, Colorado School of Mines |
| 4:00pm | TF-TuA7 Invited Paper Mechanical Properties of ALD Thin Films Helmut Baumgart, Old Dominion University |
| 4:40pm | TF-TuA9 Effect of Atomic Layer Deposition on the Mechanical Properties of Synthetic Nonwoven and Electrospun Polymer Fibers Christina Devine, C.J. Oldham, J.S. Jur, G.N. Parsons, North Carolina State University |
| 5:00pm | TF-TuA10 Invited Paper In Situ Studies of Oxide ALD for Crystalline Oxide Growth on Silicon Brian Willis, H. Wang, University of Connecticut, C. Zhang, Chinese Academy of Sciences, China, X. Jiang, University of Connecticut |
| 5:40pm | TF-TuA12 Nucleation and Interface Formation of Al2O3 on HF-treated InGaAs(100) by Atomic Layer Deposition A.J. Muscat, Bernal Granados, F.L. Lie, University of Arizona |