| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-TuA1 Prediction of Ion Sheath Shape and Ion Trajectory during Plasma Etching Processing using On-Wafer Monitoring Technique Ryosuke Araki, K. Miwa, T. Kubota, Tohoku University, Japan, T. Iwasaki, K. Ono, Mizuho Information & Research Institute, Inc., Japan, S. Samukawa, Tohoku University, Japan |
| 2:20pm | PS2-TuA2 Measuring Electron Density, Electron Temperature, and Plasma Potential with RF Frequency Probes Dave Boris, R.F. Fernsler, S.G. Walton, Naval Research Laboratory (NRL) |
| 2:40pm | PS2-TuA3 Effects of Wire Thickness, Neutral Pressure and Gas Composititon on the Inflection Point Technique Bordin Dechawatanapisal, N. Hershkowitz, J.P. Sheehan, CS. Yip, University of Wisconsin-Madison |
| 3:00pm | PS2-TuA4 A New Diagnostic Tool System of Radio- Frequency Plasmas by Employing Floating-Emissive Probe Yasuyuki Taniuchi, M. Utsumi, Tokai University, Japan, M. Yanagisawa, Landmark Technology Corporation, Japan, H. Shindo, Tokai University, Japan |
| 4:00pm | PS2-TuA7 A Comparison of Emissive Probe Techniques for Electric Potential Measurements in a Complex Plasma J.P. Sheehan, University of Wisconsin-Madison, Y. Raitses, Princeton Plasma Physics Laboratory, N. Hershkowitz, University of Wisconsin-Madison, I. Kaganovich, N.J. Fisch, Princeton Plasma Physics Laboratory |
| 4:20pm | PS2-TuA8 Probe Diagnostics Instrument for Laboratory and Industrial RF Plasmas Valery Godyak, RF Plasma Consulting |
| 4:40pm | PS2-TuA9 Ion Energy Distributions in Pulsed Plasmas with Synchronous DC Bias: Effect of Noble Gas Weiye Zhu, H. Shin, V.M. Donnelly, D.J. Economou, University of Houston |
| 5:00pm | PS2-TuA10 Invited Paper 2011 AVS John A. Thornton Award Lecture - As Device Dimensions Continue to Shrink… A Journey Through Thirty Years of Plasma Etching Diagnostics and Mechanisms Vincent Donnelly, University of Houston |