| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-FrM1 Delivering Activation Energy to Surfaces in Atmospheric Pressure Plasmas: Local and Remote Z. Xiong, N.Yu. Babaeva, Mark Kushner, University of Michigan |
| 8:40am | PS-FrM2 Kinetic Effects in Low Pressure Capacitively Coupled Plasmas Alex Likhanskii, P. Stoltz, Tech-X Corp. |
| 9:00am | PS-FrM3 Invited Paper Challenges in Modeling of Plasma Interactions in Medicine and Biology: What Insights Can You Expect? Natalia Yu Babaeva, M.J. Kushner, University of Michigan |
| 10:00am | PS-FrM6 Magnetic Field - Plasma Interaction in Low Pressure VHF Capacitively Coupled Plasmas using PIC-MCC/Fluid Hybrid Model Kallol Bera, A. Agarwal, S. Rauf, K. Collins, Applied Materials, Inc. |
| 10:20am | PS-FrM7 Simulations of SF6 Plasma Etching in the GEC Reference Cell Sergio Lopez-Lopez, Quantemol - University College London, UK, J.J. Munro, D. Brown, Quantemol Ltd., UK, J. Tennyson, University College London, UK |
| 10:40am | PS-FrM8 Simulation of InP Etching under ICP Ar/Cl2/N2 Plasma Discharge: Role of N2 in the Sidewall Passivation R. Chanson, Ahmed Rhallabi, M.C. Fernandez, Ch. Cardinaud, J.P. Landesman, Institut des Matériaux Jean Rouxel (IMN), France, S. Bouchoule, A. Talneau, Laboratoire de Photonique et de Nanostructures (LPN), France |
| 11:00am | PS-FrM9 Three-Dimensional Modeling and Formation Mechanisms of Atomic-Scale Surface Roughness during Si Etching in Chlorine-Based Plasmas Hirotaka Tsuda, Y. Takao, K. Eriguchi, K. Ono, Kyoto University, Japan |
| 11:20am | PS-FrM10 Control of the Ion Energy Distribution on a Plasma Electrode Paola Diomede, D.J. Economou, V.M. Donnelly, University of Houston |
| 11:40am | PS-FrM11 Molecular Dynamic Simulation for Selective Etching of Silicon Nitride and Silicon Oxide by Hydrofluorocarbon Ions Ryota Shigekawa, M. Isobe, Osaka University, Japan, M. Fukasawa, T. Tatsumi, Sony Corporation, Japan, S. Hamaguchi, Osaka University, Japan |