AVS 58th Annual International Symposium and Exhibition
    Plasma Science and Technology Division Thursday Sessions

Session PS+TF-ThM
Plasma Deposition and Plasma Enhanced ALD

Thursday, November 3, 2011, 8:00 am, Room 202
Moderator: Sing-Pin Tay, Mattson Technology Inc.


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am PS+TF-ThM1
High Quality SiNx by Microwave RLSA Plasma Enhanced Atomic Layer Deposition
Takayuki Karakawa, M. Oka, N. Fukiage, H. Ueda, T. Nozawa, Tokyo Electron Technology Development Institute, INC., Japan
8:20am PS+TF-ThM2
Composition, Morphology and Optical Dispersion of Plasma Polymerized Titanium Oxide Derived Using PECVD
Lirong Sun, General Dynamics Information Technology, A. Reed, Air Force Resarch Laboratory, H. Jiang, General Dynamics Information Technology, J.T. Grant, University of Dayton Research Institute, R. Jakubiak, Air Force Resarch Laboratory
8:40am PS+TF-ThM3 Invited Paper
Plasma Deposition of Carbide-Based Composite Membranes for Hydrogen Purification
Colin Wolden, Colorado School of Mines
9:20am PS+TF-ThM5
Quantum Dot Sensitized Solar Cells using Nanoparticles of Si Compounds Fabricated by Multihollow Discharge Plasma CVD
Masaharu Shiratani, G. Uchida, M. Sato, Y. Wang, K. Koga, N. Itagaki, Kyushu University, Japan
9:40am PS+TF-ThM6
Structure of Organosilicon Polymeric Films Obtained by Expanding Thermal Plasma Chemical Vapor Deposition
P.H. Tchoua Ngamou, M.C.M. van de Sanden, M. Creatore, Eindhoven University of Technology, the Netherlands
10:40am PS+TF-ThM9
Impact of VUV Photons and Ions on Metal Oxide Films Prepared by Plasma-Assisted ALD with Substrate Biasing
Harald Profijt, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
11:20am PS+TF-ThM11
Plasma Enhanced Atomic Layer Deposition and Plasma Etching of Gadolinium Oxide High-k Gate Dielectrics
Steven Vitale, MIT Lincoln Laboratory, C. Hodson, Oxford Instruments Plasma Technology, UK
11:40am PS+TF-ThM12
Nano- & Micro-Hybrid Materials by a Novel Plasma Deposition Method
M. Gulas, A. Felten, Research Center in Physics of Matter and Radiation (PMR) Facultés Universitaires Notre-Dame de la Paix (FUNDP), Belgium, A. Mansour, J. Guillot, Centre de Recherche Public - Gabriel Lippmann, Luxembourg, N. Claessens, Université Libre de Bruxelles, Belgium, F. Reniers, Universite Libre de Bruxelles, Belgium, A.L.D. Kilcoyne, Lawrence Berkeley National Laboratory, Jean-Jacques Pireaux, Research Center in Physics of Matter and Radiation (PMR) Facultés Universitaires Notre-Dame de la Paix (FUNDP), Belgium