AVS 58th Annual International Symposium and Exhibition
    Vacuum Technology Division Monday Sessions
       Session VT-MoA

Paper VT-MoA6
Vacuum Quality Measurement at UHV Levels with AutoResonant Ion Trap Mass Spectrometers

Monday, October 31, 2011, 3:40 pm, Room 111

Session: Optical and Mass Spectroscopy for Gas Analysis and Pump Modeling
Presenter: Gerardo Brucker, Brooks Automation, Inc.
Authors: G.A. Brucker, Brooks Automation, Inc.
J. Rathbone, Brooks Automation, Inc., Granville-Phillips Products
B.J. Horvath, Brooks Automation, Inc., Granville-Phillips Products
Correspondent: Click to Email

Autoresonant Ion Trap Mass Spectrometers (ART MS) have recently become commercially available and are rapidly finding applications in many areas of the vacuum technology industry. One of the biggest benefits of ART MS sensors is their ability to provide fast and sensitive data at ultrahigh vacuum levels (UHV). The ability to operate the sensor remotely, i.e. with the electronics unit away from the gauge head, has also made ART MS technology the gas analysis instrumentation of choice for hard radiation environments. The performance of ART MS sensors under UHV conditions is discussed. Test results for gas analysis measurements performed under UHV conditions are shown and compared against similar results obtained with legacy instrumentation including quadrupole-based residual gas analyzers. Different approaches available to improve the performance of an ART MS instrument under UHV conditions are explored and explained based on the basic principles of operation of the technology.