| AVS 58th Annual International Symposium and Exhibition | |
| Thin Film Division | Friday Sessions |
| Session TF-FrM |
| Session: | Thin Films: Growth and Characterization II |
| Presenter: | Lei Wang, College of William and Mary |
| Authors: | L. Wang, College of William and Mary K. Yang, College of William and Mary C. Clavero, College of William and Mary E. Crisman, College of William and Mary V. Dinavahi, College of William and Mary I. Novikova, College of William and Mary R.A. Lukaszew, College of William and Mary |
| Correspondent: | Click to Email |
***PLEASE NOTE YOU MUST IDENTIFY A DIFFERENT PRESENTER FOR THIS ABSTRACT. YOU MAY PRESENT ONE PAPER ONLY (ORAL OR POSTER) AT THE CONFERENCE. YOU ARE ALREADY LISTED AS PRESENTER OF ABSTRACT #554***Surface Plasmon Resonance (SPR) excitation in metallic thin films and nanostructures has been widely applied to study biomolecules absorption, bio-imaging, bio-sensing, and sensitivity enhanced Raman spectroscopy [1,2,3]. However, although the theoretical principles underlying SPR excitation are applicable to any conductive material, only metals, and in particular Au and Ag, have been considered for practical applications. Here we investigate SPR excitation in a conducting metal oxide such as RuO2. Due to the optical properties frequency dependence, SPR excitation is more intense in the infrared region for this material. The RuO2 thin films investigated were grown using reactive magnetron sputtering on two different substrates resulting on amorphous RuO2 films when deposited on glass and crystalline RuO2 films when epitaxially deposited on TiO2 (001) substrates. We have used Atomic Force Microscopy (AFM) and Reflection High-Energy Electron Diffraction (RHEED) to characterize the surface morphology and microstructure of these samples. Four-point probe was used to investigate the electrical conductivity properties and ellipsometry was used to characterize the optical properties of the films. We will show a comparison of the physical properties including the SPR excitation between these two kinds of thin film RuO2 samples. The investigation of SPR in conducting metal oxide materials provides a significant advancement for thin film characterizations as well as opens new venues for photonic and plasmonic applications.
This work was financially supported by NSF (DMR-1006013).
[1] Amanda J. Haes and Richard P. Van Duyne, J. Am. Chem. Soc., 2002, 124 (35), pp 10596–10604.
[2] Lin He, Michael D. Musick, Sheila R. Nicewarner, Frank G. Salinas, Stephen J. Benkovic, Michael J. Natan, and Christine D. Keating, J. Am. Chem. Soc., 2000, 122 (38), pp 9071–9077.
[3] Lehui Lu, Atsuko Kobayashi, Keiko Tawa, and Yukihiro Ozaki, Chem. Mater., 2006, 18 (20), pp 4894–4901