AVS 58th Annual International Symposium and Exhibition
    Advanced Surface Engineering Division Thursday Sessions
       Session SE-ThM

Paper SE-ThM12
Synthesis of Al-Cr-O and Al-Cr-O-N Thin Films in Corundum-Type Structure by Reactive r.f. Magnetron Sputtering

Thursday, November 3, 2011, 11:40 am, Room 104

Session: Nanostructured Thin Films and Coatings
Presenter: Michael Stueber, Karlsruhe Institute of Technology (KIT), Germany
Authors: M. Stueber, Karlsruhe Institute of Technology (KIT), Germany
D. Diechle, Walter AG, Germany
H. Leiste, Karlsruhe Institute of Technology (KIT), Germany
S. Ulrich, Karlsruhe Institute of Technology (KIT), Germany
Correspondent: Click to Email
The PVD synthesis of wear and oxidation resistant aluminum oxide and derivative coatings is currently attracting large scientific and technical interest. Ternary Al-Cr-O thin films with mechanical properties comparable or superior to binary Al-O thin films can be deposited at moderate deposition temperatures. New coatings from the quaternary Al-Cr-O-N system could even offer increased strength, hardness and toughness. A combinatorial approach to the growth of Al-Cr-O-N thin films by means of reactive r.f. magnetron sputtering will be presented. For specific deposition conditions well adherent, nanocrystalline Al-Cr-O-N thin films with high Vickers hardness and elastic modulus values were grown at non-equilibrium conditions on cemented carbide and silicon substrates. Detailed results on the coatings composition, constitution, microstructure and properties will be presented and discussed in comparison to ternary Al-Cr-O thin films deposited under identical conditions.