| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | Roman Chistyakov, Zond Inc/ Zpulser |
| Authors: | R. Chistyakov, Zond Inc/ Zpulser B. Abraham, Zond Inc/ Zpulser J.Y. Park, SEMICAT Inc |
| Correspondent: | Click to Email |
New pulsed plasma generator for reactive magnetron sputter processes was developed. (old sentence)
A new pulsed plasma generator for reactive magnetron sputter processes has been developed. (new sentence)
Compare with existing pulsed DC plasma generators new generator has high current capabilities in the range of 100 – 300 A.(old sentence)
Compared to existing pulsed DC plasma generators, the new generator has high current capabilities in the range of 100 – 300 A. (new sentence)
In proposed method near arc free magnetron discharge in reactive atmosphere can be generated by adjusting the frequency and amplitude and shape of the voltage pulses. (old sentence)
In the proposed method, near arc free magnetron discharge in reactive atmosphere can be generated by adjusting the frequency and amplitude and shape of the voltage pulses.(new sentence)
The application of new pulse plasma generator for reactive sputtering of SiN, SiO2, AlN and TiO2 films at ENDURA 200 mm tool (AMAT) will be discussed. (old sentence)
The application of new pulse plasma generator for reactive sputtering of Si3N4, SiO2, AlN and TiO2 films at ENDURA 200 mm tool (AMAT) will be discussed.(new sentence)