AVS 58th Annual International Symposium and Exhibition
    Nanometer-scale Science and Technology Division Thursday Sessions
       Session NS-ThM

Paper NS-ThM2
Chemical Modification and Patterning of Self Assembled Monolayers using Scanning Electron and Ion-Beam Lithography

Thursday, November 3, 2011, 8:20 am, Room 203

Session: Molecular Assembly and Devices
Presenter: Maria Perez Roldan, European Commission, JRC Institute for Health And Consumer Protection, Italy
Authors: M.J. Perez Roldan, European Commission, JRC Institute for Health And Consumer Protection, Italy
C. Pascual Garcia, European Commission, JRC Institute for Health And Consumer Protection, Italy
G. Marchesini, European Commission, JRC Institute for Health And Consumer Protection, Italy
D. Gilliland, European Commission, JRC Institute for Health And Consumer Protection, Italy
G. Ceccone, European Commission, JRC Institute for Health And Consumer Protection, Italy
P. Colpo, European Commission, JRC Institute for Health And Consumer Protection, Italy
F.J. Rossi, European Commission, JRC Institute for Health And Consumer Protection, Italy
Correspondent: Click to Email
We present chemical modification of self assembled monolayers (SAMs) using electron and ion-beam lithographies.We used thiolated polyethylene oxide (PEO) SAMs on gold to fabricate chemically contrasting patterns at the nanoscale. Patterned surfaces were characterized by X-ray photoelectron spectroscopy (XPS), time of flight-secondary ion mass spectrometry (ToF-SIMS). Results showed a chemical modification of surfaces patterned by means of electron beam (e-beam) lithography and a removal of PEO SAMs on the areas treated with the ion beam. The chemical modification of PEO SAMs converted the non-fouling surfaces on fouling surfaces.