AVS 58th Annual International Symposium and Exhibition
    Nanomanufacturing Science and Technology Focus Topic Tuesday Sessions
       Session NM-TuP

Paper NM-TuP1
Nanoscopic Polymerization of Polyaniline on the Nanostructured Alumina Surface and the Nano-Contact Transfer of the Nanofabricated Polyanil

Tuesday, November 1, 2011, 6:00 pm, Room East Exhibit Hall

Session: Nanomanufacturing Science and Technology Poster Session
Presenter: Yohei Watanabe, Kanto Gakuin University, Japan
Authors: Y. Watanabe, Kanto Gakuin University, Japan
T. Mori, Kanto Gakuin University, Japan
H. Kato, Kanto Gakuin University, Japan
S. Takemura, Kanto Gakuin University, Japan
T. Hiramatsu, Kanto Gakuin University, Japan
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The aim of the present study is to present what types of nano-size structures and patterns made of polyaniline can be created in local polymerization in nanoscopic area such as nano-size crater or trench. The authors also intend that the fabricated polyaniline patterns can be transferred to other substrate such as silicon wafer by a nano-contact method. Nanoscopic polymerization of polyaniline was conducted locally in nanoscale craters or highly-oriented line pattern with nanoscale trenches fabricated on an aluminum surfaces by combined process of chemical treatments and anodization. Nanoscopic polymerization process was performed by a wet method. Aniline monomer solved in pure water, which was added by oxidation agent ammonium peroxodisulfate (APS) solved in HCl in a test tube, was dropped on the nanostructures as a droplet with a micropipett and was extended on the surface. Aniline monomer was being polymerized in a test tube under those conditions. As for the linked-crater structure, the size of the crater ranged from 50 nm to 100 nm by dynamic force microscopy (DFM) measurements. On the other hand, as for the highly-oriented line structure, the line distance was estimated at 30-40 nm. Nanoscopic polymerization was conducted on the two types of nanostructured templates. DFM observation and the cross section analysis were conducted on pre-deposited and deposited surfaces. For the nanoscale polymerization on the linked-crater structure, one of the characteristic patterns was a polyaniline dots pattern. The DFM image showed that each crater was filled with polyaniline creating polyanilne dots. It was also found that binding small dots formed a tree-like network made of polyaniline covering the linked-crater surface. In the case of lower concentration of APS, dots became smaller. Preliminary stage of nanowire growth was also observed. On the other hand, as for the nanoscale polymerization on the highly-oriented line structure, one of the characteristic patterns was polyaniline line pattern where polyaniline polymerized in each trenches. At the next stage, nano-contact transfer of the fabricated polyaniline patterns to Si wafers was tried. In the case of the line pattern template, it was found that a polyaniline line pattern could be transferred to a Si wafer for the lower concentration of aniline monomer. It was also confirmed that the transferred pattern was changed into dots pattern for the higher concentration of aniline. By atomic force microscopy-current imaging tunneling spectroscopy (AFM-CITS) measurements, the obtained IV characteristics indicated the gap became broaden on the transferred polyaniline pattern.