AVS 58th Annual International Symposium and Exhibition
    Nanomanufacturing Science and Technology Focus Topic Monday Sessions
       Session NM+MS+NS+TF-MoM

Invited Paper NM+MS+NS+TF-MoM3
Industrialization of Atomic Layer Deposition: From Design to Deposition

Monday, October 31, 2011, 9:00 am, Room 207

Session: ALD for Nanomanufacturing
Presenter: Jill Becker, Cambridge NanoTech, Inc.
Authors: J.S. Becker, Cambridge NanoTech, Inc.
A. Bertuch, Cambridge NanoTech, Inc.
R. Bhatia, Cambridge NanoTech, Inc.
L. Lecordier, Cambridge NanoTech, Inc.
G. Liu, Cambridge NanoTech, Inc.
M. Sershen, Cambridge NanoTech, Inc.
M. Sowa, Cambridge NanoTech, Inc.
R. Coutu, Cambridge NanoTech, Inc.
G.M. Sundaram, Cambridge NanoTech, Inc.
Correspondent: Click to Email
The demonstrated benefits provided by Atomic Layer Deposition (ALD) in producing films of exceptional uniformity, and conformality, has set the stage for its use in large area, batch processing, and Roll-to-Roll applications. In this work we discuss the use of Computational Fluid Dynamics (CFD) as a means of gaining insight into the system performance of such industrial instruments, but also as a technique for refining system design. Additionally we describe the basic underpinnings of design for ALD systems operated under atmospheric conditions, (for Roll-to-Roll use), along with the design factors which must be considered for zone separated ALD methods. Finally we will present film results taken from a zone-separated ALD system, and discuss the salient aspects of the deposition process.