| AVS 58th Annual International Symposium and Exhibition | |
| Helium Ion Microscopy Focus Topic | Tuesday Sessions |
| Session HI-TuP |
| Session: | Aspects of Helium Ion Microscopy Poster Session |
| Presenter: | Xianghui Zhang, Bielefeld University, Germany |
| Authors: | X. Zhang, Bielefeld University, Germany H. Vieker, Bielefeld University, Germany A. Beyer, Bielefeld University, Germany A. Gölzhäuser, Bielefeld University, Germany |
| Correspondent: | Click to Email |
A helium-ion microscope can be used as beam writing tool on electron beam photoresists, such as hydrogen silsesquioxane (HSQ). It has been demonstrated to have a high resolution, a high sensitivity and a low proximity effect.
Here we report the fabrication of carbon nanomembranes from aromatic self-assembled monolayers (SAMs) with a helium ion beam as direct writing tool. Cross-linking of SAMs is achieved by exposure with helium ions which results in the formation of mechanically stable carbon nanomembranes. The required doses for cross-linking with helium ions are approximately one order of magnitude lower than with electrons. The cross-linked SAMs were transferred to either silicon substrates with an oxide layer for optical characterization or transmission electron microscopy (TEM) grids for preparing free-standing carbon nanomembranes.
With helium ion based cross-linking we fabricated patterned nanomembranes as well. Furthermore, the proximity effect and the sample damage on the nano-scale pattern is investigated and discussed.