AVS 58th Annual International Symposium and Exhibition
    Graphene and Related Materials Focus Topic Monday Sessions
       Session GR-MoM

Paper GR-MoM4
Investigating Graphene Nucleation on C-Face SiC via Electron Channeling Contrast Imaging and Raman Mapping

Monday, October 31, 2011, 9:20 am, Room 208

Session: Graphene Growth
Presenter: Jennifer Hite, U.S. Naval Research Laboratory
Authors: J.K. Hite, U.S. Naval Research Laboratory
J.D. Caldwell, U.S. Naval Research Laboratory
J.L. Tedesco, U.S. Naval Research Laboratory
R.L. Myers-Ward, U.S. Naval Research Laboratory
C.R. Eddy, Jr., U.S. Naval Research Laboratory
D.K. Gaskill, U.S. Naval Research Laboratory
Correspondent: Click to Email

Epitaxial graphene (EG) has lately garnered enormous interest, due to its high free-carrier mobility and compatibility with semiconductor processing. Furthermore, EG RF field effect transistors have been demonstrated.1 Current RF device work has been on the Si face (0001) semi-insulating 6H-SiC substrates as EG on this face mainly consists of mono- and bilayer graphene. In contrast, the C-face consists of up to a dozen or more graphene layers and has a rougher morphology. Even so, there is significant interest in obtaining few layer, smooth EG on the C-face of SiC due to its superior mobility (for similar charge density) as compared to growth on the Si-face. However, the growth mechanism of this material is not well understood. Recently, it was shown that C-face EG grown in an argon ambient slows the growth rate and, under certain conditions, results in localized growth of the graphene on the C-face.2 These localized areas, referred to herein as graphene covered basins (GCBs), create the possibility of investigating the initial stages and mechanism of graphene growth on the C-face of SiC.

Previously, we had used electron channeling contrast imaging (ECCI) to investigate GCB morphology as a function of GCB size and growth conditions for EG growth on C-face SiC.3 Threading screw dislocations (TSDs) in the SiC substrate were found to be nucleation sites for GCBs. The TSDs were easily identified at the centers of small EG GCBs (<20 μm diameter). This work shows the evidence that the TSDs fade then disappear with increasing GCB size, suggesting that as the GCBs grow or coalesce to larger diameters the TSDs become buried. Concurrently, Raman mapping experiments determined graphene thickness and quality at GCB genesis; the maximum graphene thickness for TSD detection in the SiC by ECCI was also determined. Initial findings with Raman mapping confirm ECCI results showing that the graphene is thicker in the middle of the GCB. The small GCBs (<20 µm), which exhibit a strong TSD signal, are comprised of roughly 3-4 monolayers of graphene in the center, with decreased thicknesses near the edge. In addition, the Raman 2D spectral linewidth for these small GCBs were correlated with thickness. Atomic force and scanning electron microscopy of the same GCBs were used to obtain correlated morphological details. These results imply that graphene growth is complex on this polar surface of SiC.

1J.S. Moon et al., IEEE Electron Device Lett. 31, 260, 2010.

2J.L. Tedesco et al., Appl. Phys. Lett. 96, 222103, 2010.

3 J.K. Hite et al., Nano Lett. 11, 1190, 2011.