| AVS 58th Annual International Symposium and Exhibition | |
| Energy Frontiers Focus Topic | Thursday Sessions |
| Session EN-ThP |
| Session: | Energy Frontiers Poster Session |
| Presenter: | Jacob Abraham, Huettinger Electronic Company, Poland |
| Authors: | P. Rozanski, Huettinger Electronic Company, Poland P. Ozimek, Huettinger Electronic Company, Poland M. Zelechowski, Huettinger Electronic Company, Poland P. Lach, Huettinger Electronic Company, Poland W. Glazek, Huettinger Electronic Company, Poland J. Abraham, Huettinger Electronic Company, Poland |
| Correspondent: | Click to Email |
Non-pulsing DC power supplies for highly arcing processes are gaining more and more interest slowly pushing out older pulsing DC power supplies as more efficient and more cost optimal. The importance of arc management in DC power supplies is taking on a new meaning as most advanced DC generators are more and more successful in sputtering highly arcing and difficult materials, providing high deposition rates at competitive investment.
It has been developed as the answer to the market’s demand to limit arc energy during an arc occurrence in sputtering. Industrial implementation has been already successfully performed with air-cooled DC power supplies that have been on the market for years. The possibility of using DC power supplies for sputtering highly-arcing materials is the result. It is the beginning of a new age in magnetron sputtering technology. Further improvement and optimization by using more efficient water cooling and faster transistors has resulted in a new generation of power supplies with state-of-the-art arc management parameters. A complementary feature of the newly-developed arc management circuitry is software that supports efficient arc handling: self-adjusting arc management settings and an internal oscilloscope.