| AVS 56th International Symposium & Exhibition | |
| Thin Film | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF3-MoA1 Invited Paper Dye-Sensitized Solar Cells: Fabricating Photoelectrodes via Atomic Layer Deposition J.T. Hupp, Northwestern University |
| 2:40pm | TF3-MoA3 Invited Paper Energy Conversion at Nano Scale F.B. Prinz, Stanford University |
| 3:40pm | TF3-MoA6 Al2O3 ALD for Improved Performance of Li Ion Batteries A.S. Cavanagh, Y.S. Jung, University of Colorado at Boulder, A.C. Dillon, National Renewable Energy Laboratory, M.D. Groner, ALD NanoSolutions Inc., S.H. Lee, S.M. George, University of Colorado at Boulder |
| 4:00pm | TF3-MoA7 Impact of Film Thickness and Thermal Treatment on the Excellent Surface Passivation of c-Si by ALD Al2O3 for Solar Cell Applications G. Dingemans, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, the Netherlands |
| 4:20pm | TF3-MoA8 Invited Paper Spatial ALD: Fabrication of Films and Devices at Atmospheric Pressure D.H. Levy, S.F. Nelson, M.S. Burberry, L.W. Tutt, R.S. Kerr, G. Zwadlo, Eastman Kodak Company |
| 5:00pm | TF3-MoA10 Invited Paper Metal Oxide and Fluoride ALD Process Development and Optimisation for Large Area Depositions M.I. Putkonen, Beneq Oy, Finland |