| AVS 56th International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-WeM1 Growth of Thin Films of Nanomeshes on Solid Surfaces through Self-Assembly F. Tao, S. Bernasek, Princeton University |
| 8:20am | TF-WeM2 Nanometer-Scale Direct-Write 3D-Patterning using Probes A.W. Knoll, D. Pires, U. Drechsler, IBM Zurich Research Laboratory, Switzerland, J.L. Hedrick, IBM Almaden Research Center, M. Despont, U.T. Duerig, IBM Zurich Research Laboratory, Switzerland |
| 8:40am | TF-WeM3 Subwavelength Patterning of Organic Monolayers Via Nonlinear Laser Processing with fs-laser Pulses N.O. Hartmann, S. Franzka, M. Mathieu, University of Duisburg-Essen, Germany, J. Koch, B.N. Chichkov, Laser Zentrum Hannover, Germany, A. Ostendorf, Ruhr-Universität Bochum, Germany |
| 9:00am | TF-WeM4 Alloy Destabilization Behavior of Cu-Ni Thin Films on Si during Solid State Dewetting S. Seshabhattar, North Carolina State University, P.D. Rack, R. Pearce, University of Tennessee, D.K. Hensley, M. Fuentes-Cabrera, J.D. Fowlkes, Oak Ridge National Laboratory, M.L. Simpson, Oak Ridge National Laboratory and University of Tennessee, A.V. Melechko, North Carolina State University |
| 9:20am | TF-WeM5 Electrical, Optical and Structural Studies of Shallow Buried Au-PMMA Composite Films formed by Very Low Energy Ion Implantation F.S. Teixeira, M.C. Salvadori, M. Cattani, University of Sao Paulo, Brazil, I.G. Brown, Lawrence Berkeley National Laboratory |
| 9:40am | TF-WeM6 Preparation and Microstructure of Silver Nanoparticles Embedded into a Flourocarbon Matrix Prepared by RF and DC Sputtering D.G. Vásquez Mazzoti, A.F. Talledo Coronado, Universidad Nacional de Ingenieria, Peru, C. Benndorf, University of Hamburg, Germany |
| 10:40am | TF-WeM9 Invited Paper Dewetting in Single and Bilayer Metallic Films under Pulsed Laser Irradiation H. Krishna, Washington University, R. Sachan, N. Shirato, J. Strader, University of Tennessee, A.K. Gangopadhyay, Washington University, H. Garcia, Southern Illinois University, R. Kalyanaraman, University of Tennessee |
| 11:20am | TF-WeM11 Subsurface Oxidation for Micropatterning Silicon (SOMS) F. Zhang, Brigham Young University, K. Sautter, Yield Engineering Systems, R.C. Davis, M.R. Linford, Brigham Young University |
| 11:40am | TF-WeM12 Variable-Thickness Patterns using Full-Wafer Dynamic Stencil Lithography V. Savu, EPFL, Switzerland, S. Sansa, F. Perez-Murano, CNM-IMB, CSIC, Spain, J. Brugger, EPFL, Switzerland |