| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-ThM1 Power Dynamics in Low Pressure Capacitively Coupled Plasma Discharges S. Rauf, K. Bera, L. Dorf, K. Collins, Applied Materials, Inc. |
| 8:20am | PS2-ThM2 Ballistic Electrons and Resulting EEDf in a DC+RF Hybrid CCP Reactor L. Xu, L. Chen, M. Funk, Tokyo Electron America |
| 8:40am | PS2-ThM3 Simulation of 450 mm Dual Freqeuncy Capacitively Coupled Plasma Tools: Conventional and Segmented Electrodes Y. Yang, Iowa State University, M.J. Kushner, University of Michigan |
| 9:00am | PS2-ThM4 A Scalable, VHF/UHF Compatible, Capacitively Coupled Plasma Source for Processing Large-Area Substrates at High Frequencies A.R. Ellingboe, D. O'Farrell, C. Gaman, Dublin City University, Ireland, F. Green, N. O'Hara, T. Michna, Phive Plasma Technologies, Ireland |
| 9:20am | PS2-ThM5 Characteristics of Ferrite Enhanced Internal Linear Antenna for Large Area (2750mm x 2350mm) Inductively Coupled Plasma Source J.H. Lim, K.N. Kim, G.H. Gweon, S.P. Hong, G.Y. Yeom, Sungkyunkwan University, Korea |
| 9:40am | PS2-ThM6 Large-Scaled ECR Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide H. Shindo, Y. Kimura, Tokai University, Japan, T. Hirao, Kochi Institute of Technology, Japan |
| 10:40am | PS2-ThM9 PIC Simulations and Probe Measurements of the EEDF in a Microwave Surface-Wave Plasma Source R.V. Bravenec, Fourth State Research, under contract to Tokyo Electron America, Inc., J.P. Zhao, L. Chen, M. Funk, Tokyo Electron America, Inc., C.Z. Tian, K. Ishibashi, T. Nozawa, Tokyo Electron Technology Development Institute, Japan |
| 11:00am | PS2-ThM10 Characterization of an Expanding Chlorine Plasma Produced by an Electromagnetic Surface-Wave O. Boudreault, S. Mattei, Université de Montréal, Canada, R. Khare, University of Houston, L. Stafford, Université de Montréal, Canada, V.M. Donnelly, University of Houston |
| 11:20am | PS2-ThM11 Vacuum Ultraviolet Plasma Emission in a Capacitively-Coupled Dielectric Etch Reactor E.A. Hudson, M. Moravej, M. Block, S. Sirard, D. Wei, K. Takeshita, Lam Research Corp., B. Jinnai, S. Samukawa, Tohoku University, Japan |
| 11:40am | PS2-ThM12 Damage-Free, Uniform and High-Target-Utilization Novel Magnetron Sputtering Plasma Source by Rotating Helical Magnet T. Goto, Tohoku University, Japan, N. Seki, T. Matsuoka, Tokyo Electron Technology Development Institute, Inc., Japan, T. Ohmi, Tohoku University, Japan |