| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1-ThA1 Invited Paper Negative Ion Surface Production in Low Pressure Plasma G. Cartry, L. Schiesko, J.M. Layet, M. Carrere, PIIM, Aix - Marseille Université - CNRS, France |
| 2:40pm | PS1-ThA3 Amorphous Hydrogenated Carbon Etching with a Low Energetic Plasma Jet T.A.R. Hansen, J.W. Weber, M.C.M. van de Sanden, R. Engeln, Eindhoven University of Technology, The Netherlands |
| 3:00pm | PS1-ThA4 Investigation of Fluorocarbon PECVD During Processing of Si and ZrO2 Surfaces M. Cuddy, E.R. Fisher, Colorado State University |
| 3:40pm | PS1-ThA6 Studies of Chlorine-Oxygen Plasmas and Evidence for Heterogeneous Formation of ClO and ClO2 V.M. Donnelly, J. Guha, University of Houston |
| 4:00pm | PS1-ThA7 Etching of Silicon and Silicon Oxide in a Pulsed Inductively Coupled Plasma with Chlorine C. Petit-Etienne, LTM/UJF, France, L. Vallier, E. Pargon, O. Joubert, LTM/CNRS, France |
| 4:20pm | PS1-ThA8 Fully Atomistic Profile Evolution Simulation of Nanometer-scale Si Trench Etching by Energetic F, Cl, and Br Beams H. Tsuda, T. Nagaoka, K. Eriguchi, K. Ono, Kyoto University, Japan, H. Ohta, University of California, Santa Barbara |
| 4:40pm | PS1-ThA9 Molecular Dynamics Simulations of Oxygen-Containing Polymer Sputtering and the Ohnishi Parameter G.K. Choudhary, J.J. Végh, D.B. Graves, University of California, Berkeley |
| 5:00pm | PS1-ThA10 Charge Trapping and Valence-band Structure of VUV-Irradiated BEOL Dielectrics J.L. Lauer, J.L. Shohet, University of Wisconsin-Madison, Y. Nishi, Stanford University, A. Antonelli, Novellus Corporatiion |