| AVS 56th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | NS-ThA1 Nanoelectrical Probing with Multiprobe SPM Systems Compatible with Scanning Electron Microscopes J. Ernstoff, Nanonics Imaging Ltd., Israel, A. Lewis, Hebrew University of Jerusalem, Israel, A. Ignatov, H. Taha, O. Zhinoviev, A. Komissar, S. Krol, D. Lewis, Nanonics Imaging Ltd., Israel |
| 2:20pm | NS-ThA2 Nanocone Chemical Analysis with High Resolution Scanning Auger Microscopy S.N. Raman, J.S. Hammond, D.F. Paul, D.G. Watson, P.E. Larson, R.E. Negri, Physical Electronics |
| 2:40pm | NS-ThA3 Epitaxial Growth of Al on Sapphire for Qubit Applications F. da Silva, University of Colorado, Denver, B.P. Gorman, M. Kaufman, Colorado School of Mines, J.S. Kline, D.A. Braje, D.S. Wisbey, D.P. Pappas, National Institute of Standards and Technology |
| 3:00pm | NS-ThA4 Real Time Scatterometry for Profile Control during Resist Trimming Process in a HBr/O2 Plasma M. El Kodadi, LTM-CNRS, France, S. Soulan, P. Schiavone, Georgia Institute of Technology, M. Besacier, LTM-CNRS, France |
| 3:40pm | NS-ThA6 Advancing QPlus AFM Performance at 5K Towards Lower Oscillation Amplitudes and Higher Frequencies A. Bettac, J. Koeble, K. Winkler, B. Uder, M. Maier, A. Felz, Omicron NanoTechnology GmbH, Germany |
| 4:00pm | NS-ThA7 Monatomic In Adatom Chains Assembled on the InAs(111)A Surface by Low-Temperature Scanning Tunneling Microscopy J. Yang, Paul Drude Institute for Solid State Electronics, Germany, K. Kanisawa, NTT Corporation, Japan, Ch. Nacci, S. Fölsch, Paul Drude Institute for Solid State Electronics, Germany |
| 4:20pm | NS-ThA8 Making Mn Substitutional Impurities in InAs using a Scanning Tunneling Microscope Y.J. Song, NIST and University of Maryland, College Park, S.C. Erwin, Naval Research Laboratory, G.M. Rutter, National Institute of Standards and Technology, P.N. First, Georgia Institute of Technology, N.B. Zhitenev, National Institute of Standards and Technology, Y. Kuk, NIST and Seoul National University, Korea, J.A. Stroscio, National Institute of Standards and Technology |