| AVS 56th International Symposium & Exhibition | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS1-ThM1 XPS – A Problem with Charge Referencing Non-Conductive Samples and Native Oxides V. Crist, XPS International LLC |
| 8:20am | AS1-ThM2 A New Web-Based System for Identifying Molecules and Molecular Structure using G-SIMS and SMILES I.S. Gilmore, M.A. Phillips, F.M. Green, T.S. Salter, M.P. Seah, National Physical Laboratory, UK |
| 8:40am | AS1-ThM3 Invited Paper Interrogating Surface Plasmons and Carbon Nanotubes with Four-Wave-Mixing Microscopy E.O. Potma, University of California, Irvine |
| 9:20am | AS1-ThM5 Observation of Ga+ Focused Ion Beam Induced X-Rays (FIBIX) L.A. Giannuzzi, FEI Company, B.P. Gorman, Colorado School of Mines |
| 9:40am | AS1-ThM6 Advances in 2D and 3D TOF-SIMS Imaging of Organics by Means of a C60 Ion Microprobe and FIB Sectioning G.L. Fisher, Physical Electronics, C. Szakal, G. Gillen, National Institute of Standards and Technology, S.R. Bryan, Physical Electronics |
| 10:40am | AS1-ThM9 Temperature Studies on the Induced Molecular Desorption by Atomic and Cluster Projectiles D.A. Brenes, D.G. Willingham, The Pennsylvania State University, Z. Postawa, Jagiellonian University, Poland, N. Winograd, The Pennsylvania State University |
| 11:00am | AS1-ThM10 Variation of Carbon Thickness on Magnetic Disk Media: Effects in TOF-SIMS Analysis on Metal Ion Attenuation and Lubricant Spectra A.M. Spool, R. Waltman, R. White, Hitachi Global Storage Technologies, Inc. |
| 11:20am | AS1-ThM11 Large Area Combinatorial Near Edge X-ray Absorption Fine Structure Images: Parallel Process Determination of Molecular Bond Concentration and Orientation on Surfaces D.A. Fischer, C. Jaye, National Institute of Standards and Technology, P. Sobol, E.L. Principe, E.L. Principe & Associates, LLC, K. Scammon, University of Central Florida |
| 11:40am | AS1-ThM12 The Workfunction Modulation of Al/TiN Bilayer Metal Gate Electrode/High-k Dielectric Gate Stack for NMOS Application E.J. Jung, C.J. Yim, W.S. Im, C.Y. Kim, D.-H. Ko, M.-H. Cho, Yonsei University, South Korea |