AVS 56th International Symposium & Exhibition
    Applied Surface Science Wednesday Sessions

Session AS-WeA
Angle-resolved X-ray Photoelectron Spectroscopy

Wednesday, November 11, 2009, 2:00 pm, Room C2
Moderator: A. Herrera-Gómez, CINVESTAV-Qro, Mexico


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm AS-WeA1 Invited Paper
ARXPS: Power and Limitations in the Search for New Microelectronics Materials and Processes
T. Conard, IMEC, Belgium
2:40pm AS-WeA3
Effects of Elastic Scattering and Analyzer-Acceptance Angle on the Analysis of Angle-Resolved XPS Data
C.J. Powell, National Institute of Standards and Technology, W.S.M. Werner, W. Smekal, Vienna University of Technology, Austria
3:00pm AS-WeA4
Combining Angle-Resolved and Inelastic Background Information into Concentration-Depth Profiles; A Massively-Parallel Algorithm and a New MEMS Electron Analyzer
P. Cumpson, Newcastle University, UK
4:00pm AS-WeA7
Application and Optimization of Depth Profile Reconstruction from XPS Data using the Maximum Entropy Method
G.J. Mishra, Kratos Analytical Ltd, UK, D.J. Surman, Kratos Analytical, K.C. Macak, Kratos Analytical Ltd, UK
4:20pm AS-WeA8
A Case Study of Depth Profile Reconstruction from Parallel ARXPS Data by Application of a Genetic Algorithm : Characterization of a Novel, Low-Energy Plasma Treatment
P. Mack, R.G. White, J. Wolstenholme, Thermo Fisher Scientific, UK, E.H. Lock, S.G. Walton, Naval Research Laboratory, D.Y. Petrovykh, Naval Research Laboratory and University of Maryland, College Park
4:40pm AS-WeA9
Advantages of AR-Hard X-ray Photoelectron Spectroscopy (HAXPES) in the Characterization of Advanced Semiconductor films.
G. Conti, Y. Uritsky, Applied Materials Inc., C. Papp, C.S. Fadley, Lawrence Berkely National Laboratory
5:00pm AS-WeA10
Evaluation of ARXPS for Thickness and Composition Determination for Typical Wafer Processing Thin Films
C. Brundle, C. R. Brundle and Associates, G. Conti, Applied Materials
5:20pm AS-WeA11
Development of ARHXPS System using Wide Acceptance Objective Lens and Compact Monochromatic Cr Kα X-ray Source
K. Kobayashi, M. Kobata, NIMS Beamline Station at SPring-8, Japan, H. Iwai, NIMS, Japan, H. Yamazui, H Takahashi, M. Kodama, M. Suzuki, ULVAC PHI Inc., Japan, E. Ikenaga, M. Machida, J.Y. Son, SPring-8/JASRI, Japan, H. Mastsuda, H. Daimon, NAIST, Japan, H. Nohira, Tokyo City Univ., Japan