| AVS 56th International Symposium & Exhibition | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS-ThA1 Factors Affecting XPS Sputter Depth Profiling of Organic Materials S.J. Hutton, I.W. Drummond, S.C. Page, C.J. Blomfield, Kratos Analytical Ltd, UK |
| 2:20pm | AS-ThA2 On the Understanding and Optimization of Etching Parameters for Optimal ToF-SIMS 2D and 3D Analysis of Biological Cells J. Brison, D.S.W. Benoit, M. Dubey, M. Robinson, P.S. Stayton, D.G. Castner, University of Washington |
| 2:40pm | AS-ThA3 On the Way to Optimal 3D Molecular Imaging with ToF-SIMS: A Comparison between C60 Single Beam and Bin/C60 Dual Beam Depth Profiling J. Brison, S. Muramoto, D.G. Castner, University of Washington |
| 3:40pm | AS-ThA6 Invited Paper Teaching Laser Desorption Mass Spectrometry Old and New Tricks in Postionization and Depth Profiling L. Hanley, University of Illinois at Chicago |
| 4:20pm | AS-ThA8 Surface Damage Evaluation of Organic Materials Irradiated with Ar Cluster Ions J. Matsuo, S. Ninomiya, K. Ichiki, H. Yamada, M. Hada, T. Aoki, T. Seki, Kyoto University, Japan |
| 4:40pm | AS-ThA9 Optimization of C60 Sputtering Conditions for Polymer Depth Profiling by TOF-SIMS S.R. Bryan, Physical Electronics, S. Iida, ULVAC-PHI, Japan, G.L. Fisher, J.S. Hammond, Physical Electronics, N. Sanada, M. Suzuki, ULVAC-PHI, Japan |
| 5:00pm | AS-ThA10 Metrics for Polymer Depth Profiling with C60 Ion Sources J.S. Hammond, S.S. Alnabulsi, S.N. Raman, J.F. Moulder, Physical Electronics |
| 5:20pm | AS-ThA11 Organic Depth Profiling of a Model Binary System: The Demonstration of Charge Transfer between Secondary Species A.G. Shard, National Physical Laboratory, UK, A. Rafati, University of Nottingham, UK, J.L.S. Lee, National Physical Laboratory, UK, M.R. Alexander, M.C. Davies, University of Nottingham, UK |