| AVS 56th International Symposium & Exhibition | |
| Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS+EM+MS+TF-MoA1 Invited Paper Spectroscopic Ellipsometry on Protein Layers: Characterization and Sensor Applications H. Arwin, Linköping University, Sweden |
| 2:40pm | AS+EM+MS+TF-MoA3 Anisotropic Optical and Magneto-Optical Properties of Sculptured Thin Films D. Schmidt, T. Hofmann, A. Kjerstad, E. Schubert, M. Schubert, University of Nebraska-Lincoln |
| 3:00pm | AS+EM+MS+TF-MoA4 Development of Hybrid Quartz Crystal Microbalance / Ellipsometric Porosimetry for the Characterization of Anisotropic Optical Materials R.A. May, D.W. Flaherty, C.B. Mullins, K.J. Stevenson, University of Texas at Austin |
| 3:40pm | AS+EM+MS+TF-MoA6 Invited Paper Multichannel Ellipsometry for Thin Film Photovoltaics Applications: From Materials to Solar Cells R.W. Collins, J. Li, M.N. Sestak, J.A. Stoke, L.R. Dahal, University of Toledo |
| 4:20pm | AS+EM+MS+TF-MoA8 Universal Behavior of Light Scattering from Self-Affine Fractal Surfaces: A Quantitative Relationship between Roughness and EMA Models A. Yanguas-Gil, B.A. Sperling, University of Illinois at Urbana-Champaign, J.R. Abelson, University of Illinois, Urbana-Champaign |
| 4:40pm | AS+EM+MS+TF-MoA9 Numerical Ellipsometry: Thin Absorbing Films Deposited on Opaque Substrates F.K. Urban, D. Barton, Florida International University, T.E. Tiwald, J A Woollam Co. |
| 5:00pm | AS+EM+MS+TF-MoA10 In situ Spectroscopic Ellipsometry As a Versatile Tool to Study Atomic Layer Deposition E. Langereis, H.C.M. Knoops, W. Keuning, A.J.M. Mackus, N. Leick, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 5:20pm | AS+EM+MS+TF-MoA11 Mueller-Matrix Ellipsometry Studies of Optically Active Structures in Scarab Beetles K. Järrendahl, J. Landin, H. Arwin, Linköping University, Sweden |