AVS 56th International Symposium & Exhibition
    Vacuum Technology Tuesday Sessions
       Session VT-TuP

Paper VT-TuP4
A Vacuum Quality Monitor Sensor using an Integrated Total and Partial Pressure Measurement Design

Tuesday, November 10, 2009, 6:00 pm, Room Hall 3

Session: Vacuum Technology Posters and Student-Built Vacuum Systems Poster Competition
Presenter: B.G. Olsen, Brooks Automation, Inc.
Authors: B.G. Olsen, Brooks Automation, Inc.
G.A. Brucker, Brooks Automation, Inc.
J. Rathbone, Brooks Automation, Inc.
S. Blouch, Brooks Automation, Inc.
M. Schott, Brooks Automation, Inc.
K. Van Antwerp, Brooks Automation, Inc.
Correspondent: Click to Email
We have refined and built upon the work of A.V. Ermakov and B.J. Hinch from Rutgers University to further develop a novel electrostatic ion trap sensor that is based upon the principles of autoresonant ion-ejection and detection for use in low mass range mass spectrometry applications. In addition, we have developed a practical method of integrating a total pressure measurement capability into the same sensor envelope. This highly integrated Vacuum Quality Measurement (VQM) sensor is comprised of a hot-filament ion source, electrostatic ion-trap mass separator, Shulz-Phelps based pressure sensor, and an electron multiplier ion detector that is shared for both UHV total pressure and ratiometric partial pressure detection. The VQM ion-trap sensor is capable of a 1-100amu scan rate within 70ms and has been coupled with a total pressure and partial pressure measurement update rate of 100ms. A set of sensor electronics has been developed to control, drive and process complex sensory data, and output the processed data into a usable form within the cycle time of the measurement update rate. Finally, a novel dual-filament ionization source design was incorporated into VQM sensor design to allow fast and easy field replacement of filaments.