AVS 56th International Symposium & Exhibition
    Vacuum Technology Tuesday Sessions
       Session VT-TuP

Paper VT-TuP10
Design, Development and Assembly of a Modified PHI 5400 XPS System for XPS/UPS Surface Analysis

Tuesday, November 10, 2009, 6:00 pm, Room Hall 3

Session: Vacuum Technology Posters and Student-Built Vacuum Systems Poster Competition
Presenter: R. Davies, University of Florida
Authors: R. Davies, University of Florida
B. Gila, University of Florida
C. Abernathy, University of Florida
Correspondent: Click to Email

A surface analysis system consisting of a vacuum chamber intended for 1-inch samples was redesigned and reconfigured to accommodate 3-inch samples due to laboratory equipment limitations and financial constraints. The surface analysis system is mainly comprised of a PHI 5400 XPS system with additional functionality provided by a SPECS UVS 10/35 UV source (UPS) and a PHI 77-067 sputter ion gun (surface analysis with depth profiling). Due to budgetary considerations, a previously used PHI 5400 XPS system was purchased. The redesign of the main vacuum chamber was necessitated by the requirement of joining this system with a 3-inch sample size Varian Gen II MBE system. The redesign of the vacuum chamber intended for surface studies involved utilizing the chamber in a horizontal orientation instead of the vertical orientation typically associated with XPS systems. Due to this reconfiguration, the vacuum chamber could both integrate with the current MBE system and accommodate 3-inch samples. The reconfiguration also introduced the need to design a sample manipulation system from square one. Working with Thermionics, a manipulation system was designed that provides for 3-inch sample transport along the x, y and z axis of the Cartesian coordinate system in addition to polar and azimuthal sample rotation. This manipulation system also includes a sample heater for surface adsorption studies up to 1200°C. The customization of the sample manipulation system provided numerous capabilities for surface analysis experimentation after being attached to the reconfigured vacuum chamber. In addition, a 56-inch long vacuum chamber, which acts as a buffer extension between the surface analysis system and both the MBE system and a vacuum briefcase, was designed and assembled. All of the vacuum plumbing necessary for the differential pumping of the sputter ion gun and UV source was designed to readily combine with the reconfigured main vacuum chamber and then assembled. A vacuum briefcase has been diagrammed to provide for sample transport from a Riber MBE 2300 system to the XPS/UPS surface analysis system under vacuum.