AVS 56th International Symposium & Exhibition
    Thin Film Tuesday Sessions
       Session TF1-TuA

Paper TF1-TuA4
A Family of High Strength Ternary Titanium and Vanadium Nitride Thin Films

Tuesday, November 10, 2009, 3:00 pm, Room B3

Session: Computational Modeling and Analysis of Thin Films
Presenter: V. Chirita, Linkoping University, Sweden
Authors: D.G. Sangiovanni, Linkoping University, Sweden
V. Chirita, Linkoping University, Sweden
L. Hultman, Linkoping University, Sweden
Correspondent: Click to Email

We use Density Functional Theory (DFT) calculations in the generalized gradient approximation (GGA) to predict the properties of a number of novel Ti-M-N and V-M-N thin films in the B1 (NaCl) structure. The new compounds are obtained by alloying TiN and VN, with Ta, Nb, V, Mo and W, respectively Nb and W, in concentrations of 50 %. We evaluate the elastic moduli and constants for all these ternaries, perform a detailed analysis of their electronic structure, and compare these results with the corresponding properties of TiN and Ti0.5Al0.5N. Our calculations show that, in terms of hardness, these ternaries compare with TiN and Ti0.5Al0.5N, as we obtain comparable, respectively increased values, for the Young and bulk moduli, in most cases. Significantly, however, these novel compounds exhibit substantially lower values of the C44 elastic constant and positive Cauchy pressures, i.e. they are considerably more ductile than TiN and Ti0.5Al0.5N. This unique combination of increased hardness and ductility, which is in contrast to the hardness/brittleness relationship typically found in hard coatings, is certainly relevant for applications in which high strength thin films/coatings are desired. In terms of electronic structure, our results reveal a layered charge density for all these ternaries, consisting in alternating high and low electron density regions, similar to that reported for MAX phase materials and other nanolaminates. This combination of metallic and ceramic properties is also evident in the density of states analysis we report. In order to fully understand the mechanism responsible for this interleaved arrangement of electrons, we carry out an improved crystal orbital overlap population (COOP) calculation and succeed in resolving energetically the bonding and antibonding contributions, of the first and second neighbors, to the chemical bonds in these compounds. Herein, we present the results of our COOP analysis, and based on this, we explain the observed trend in hardness and ductility as a result of the interaction between the eg and t2g sets of d orbitals characteristic to these ternaries.