AVS 56th International Symposium & Exhibition
    Surface Science Friday Sessions
       Session SS2-FrM

Paper SS2-FrM7
Hydrogen-bond Mediated Chemistry of Glycine on Si(111)7×7: A Catch-And-Release Approach to Surface Functionalization

Friday, November 13, 2009, 10:20 am, Room N

Session: Semiconductor Surfaces and Interfaces II: Si
Presenter: K.T. Leung, University of Waterloo, Canada
Correspondent: Click to Email

The growth of glycine film by thermal evaporation on Si(111)7×7 at room temperature has been studied by X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). In contrast to the common carboxylic acids, glycine is found to adsorb on the 7×7 surface through dissociation of the N-H bond (instead of the O-H bond). The presence of a transitional adlayer between the first adlayer and the zwitterionic multilayer is identified by its characteristic N 1s XPS features attributable to intermolecular N-to-HO hydrogen bond. An intramolecular proton transfer mechanism is proposed to account for the adsorption process through the amino group. We also demonstrate that the observed transitional adlayer can be used as a flexible platform to “catch-and-release” biomolecules with compatible H-bonding active sites in a controllable and reversible manner. Intricate evolution of the surface adsorption arrangement during the initial growth has also been monitored by STM. Early evidence of collective assembly of glycine into novel structures in the nanometer length scale could be found.