AVS 56th International Symposium & Exhibition
    Surface Science Tuesday Sessions
       Session SS1+PS+TF+AS+NS-TuA

Paper SS1+PS+TF+AS+NS-TuA2
Surface Morphology Control and 3D Structure Development with Cryogenic Assisted Electron Beam-Induced-Deposition

Tuesday, November 10, 2009, 2:20 pm, Room C1

Session: Non-Thermal Chemistry / Ion, Electron Processes
Presenter: M. Bresin, University at Albany SUNY
Authors: M. Bresin, University at Albany SUNY
K.A. Dunn, University at Albany SUNY
Correspondent: Click to Email

Electron beam-induced-deposition (EBID) of platinum-containing materials was performed at cryogenic temperatures. Deposit morphology, microstructure and nanostructure have been characterized by scanning and transmission electron microscopy (SEM and TEM), and shown to be controllable by the electron fluence used for EBID. 3D structures were developed using a multilayer deposition method, facilitating the creation of hanging, suspended or incorporated-gap structures.
 
Experiments were performed using an FEI Nova 600 Nanolab dual beam system with a LN2 cryogenic stage, enabling substrate temperatures of -155±5oC. A gaseous platinum precursor (MeCpPtMe3) was first condensed onto the cooled substrate using a capillary-style gas injection system (GIS). Condensate thicknesses between 100nm-3mm were produced by adjusting the GIS-substrate gap and precursor crucible temperature. Next, gas flow was terminated and the condensate was irradiated with an electron beam to induce precursor decomposition. When the substrate was returned to room temperature, any unreacted precursor desorbed and was removed by the pumping system, while irradiated regions showed clear evidence of successful deposition. The morphology of the deposited material depended on exact deposition conditions, and exhibited several distinct types absent from deposits made by conventional (room temperature) EBID.
 
3D structures were developed with a multilayer deposition method. In this method, multiple layers were used to take advantage of the electron penetration depth within the condensate, through which the depth of deposition could be controlled. An initial layer was first condensed and a region was deposited with the electron beam to act as a substrate-anchoring site. A second condensed layer was then applied such that electrons could only penetrate to the top of the initial condensed layer. The electron beam was then shifted, to deposit a section partially over the anchoring region (in the initial layer) with the remainder over unreacted area. After reheating, part of the second deposit was found to have adhered to the anchoring region, while the rest hung over vacuum. Using similar process, structures were also developed to create embedded gaps or tunnels.
 
Taken together, these observations have important implications for the creation of arbitrarily large or complex structures previously untenable by EBID fabrication. The growth mechanism and potential applications will be discussed, from nanotechnology to osteointegration.