AVS 56th International Symposium & Exhibition
    Advanced Surface Engineering Monday Sessions
       Session SE2-MoM

Invited Paper SE2-MoM1
Industrialization of Metal Ion Sputtering

Monday, November 9, 2009, 8:20 am, Room C4

Session: Pulsed Plasmas in Surface Engineering
Presenter: R. Cremer, KCS Europe
Correspondent: Click to Email

Since its introduction by Kouznetsov et al. in 1999, the HIPIMS technology has seen a remarkable rise in interest from both academic and industrial viewpoint. Although the high ionization of the plasma and the resulting advantages for industrial sputter applications have been verified more than a decade ago, industrial usage of the metal ion sputtering technology has been limited due to various technical drawbacks.

Only recently, a various number of authors have reported the overcome of the hitherto existing disadvantages of the technology like low deposition rate, biasing issues, arcing and reliability of the technology.

This paper gives an overview on the industrialization of metal ion sputtering in various applications. Special focus will be given to the comparison of ionization in different coating technologies like sputtering, metal ion sputtering, arc ion plating and thermionic arc evaporation. The paper will also comment on future options and limitations of industrial metal ion sputtering.