| AVS 56th International Symposium & Exhibition | |
| Advanced Surface Engineering | Monday Sessions |
| Session SE1-MoM |
| Session: | Photocatalytic Coatings |
| Presenter: | M.S. Wong, National Dong Hwa University, Taiwan |
| Authors: | H.C. Hsing, National Dong Hwa University, Taiwan H.T. Chang, National Dong Hwa University, Taiwan T.Y. Lu, National Dong Hwa University, Taiwan C.C. Mo, National Dong Hwa University, Taiwan M.S. Wong, National Dong Hwa University, Taiwan |
| Correspondent: | Click to Email |
Transparent conducting niobium-doped titania was prepared by reactive co-sputtering of Ti and Nb metal targets in oxygen and argon plasma. The as-deposit films were annealed at 650℃ under air atmosphere for 8 hr and then hydrogen annealed. Two different H2-annealig procedures were executed to generate different concentration of oxygen vacancies: the H2-annealing time ranges from 10 min to 4 hr under constant temperature and H2-annealing temperature ranges from 200℃ to 800℃ under constant time. From the XPS spectra, the concentration of oxygen vacancies was observed, and directly affects the carrier concentrations in the thin film. The thin film’s structure and optical properties was also measured and discussed.