AVS 56th International Symposium & Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS1-WeM

Paper PS1-WeM3
Characterization and Active Stabilization of Plasma and Generator Interactions

Wednesday, November 11, 2009, 8:40 am, Room A1

Session: Plasma Diagnostics, Sensors, and Control I
Presenter: D. Carter, Advanced Energy Industries, Inc.
Authors: V.L. Brouk, Advanced Energy Industries, Inc.
D. Carter, Advanced Energy Industries, Inc.
J. Roberg, Advanced Energy Industries, Inc
Correspondent: Click to Email

Plasma instabilities are often seen in low power, low pressure, electronegative discharges. Instabilities affecting particle density, optical emission and coil voltage have been observed with oscillation frequencies ranging from a few hundred hertz to well over one hundred kilohertz [1,2]. While instabilities can be inherent to plasma conditions it is well known that power delivery plays an important role in promoting or propagating the behavior. A study of the mutual interaction between RF amplifier and plasma impedance shows the alignment between impedance trajectory and the power profile contours of the generator is critical in determining a system’s sensitivity to instabilities. Reactive elements in the delivery path can be used to rotate impedance trajectories but the recent advent of variable frequency RF supplies has provided a more convenient means for trajectory rotation and active stabilization. In this work we empirically evaluate these behaviors and demonstrate the utility of RF frequency as a controllable parameter for plasma stabilization. In defining an active stability control system, we demonstrate measurements for detecting and quantifying instabilities. Instability oscillation frequency offers insight into the nature of parasitic feedback from mutual generator-plasma interaction and thus we show how discriminating instability frequency is also useful in defining an intelligent stability control system.

1) A. M. Marakhtanov, et. al., J. Vac. Sci. Technol. A 21 (6), Nov/Dec 2003

2) A. Descoeudres, et. al., Plasma Sources Sci. Technol. 12 (2003) 152–157