AVS 56th International Symposium & Exhibition
    Biomaterial Interfaces Friday Sessions
       Session BI+AS+NS-FrM

Paper BI+AS+NS-FrM4
Arbitrary Topographical Patterns Fabrication by using Two-Photon Photopolymerization

Friday, November 13, 2009, 9:20 am, Room K

Session: Micro and Nanoengineering of Biointerfaces II
Presenter: H.J. Jeon, University of California, Berkeley
Authors: H.J. Jeon, University of California, Berkeley
H. Hidai, Tokyo Institute of Technology, Japan
D.J. Hwang, University of California, Berkeley
K.E. Healy, University of California, Berkeley
C.P. Grigoropoulos, University of California, Berkeley
Correspondent: Click to Email

Two photon photopolymerization (TPP) is a direct laser writing technique, which is known as a powerful tool to make arbitrary 3D structures. Here we demonstrate a method for fabricating high aspect ratio (~10) patterns of varying height by using TPP process in order to study contact guidance of cells. Ridge patterns of various heights and widths were fabricated through single laser scanning steps by low numerical aperture optics, hence at much higher processing throughput. Fibroblast cells were seeded on parallel line patterns of different height (~1.5-μm, ~0.8-μm, and ~0.5-μm) and orthogonal mesh patterns (~8-μm and ~4-μm height, ~5-μm and ~5.5-μm height, and ~5-μm and ~6-μm height). Cells experienced different strength of contact guidance depending on the ridge height. Furthermore, cell morphology and motility on microscale anisotropic cross patterns and parallel line patterns in different aspect ratio (1:2, 1:4, and 1:∞), size of grid (12-, 16-, and 24-µm distance neighboring longer side ridges) was also studied quantitatively. The significant effect of the cross patterns on cell alignment and directionality of migration, and motility was observed on 1:4 cross patterns and parallel line patterns, even though all cross patterns could have an effect on cell attachment and morphology. Overall, it is noted that cell morphology and motility can be influenced by the height of ridges, the aspect ratio of cross pattern and the size of grid.