AVS 56th International Symposium & Exhibition
    Applied Surface Science Monday Sessions
       Session AS+EM+MS+TF-MoM

Invited Paper AS+EM+MS+TF-MoM3
Industrial Applications of Spectroscopic Ellipsometry

Monday, November 9, 2009, 9:00 am, Room C2

Session: Spectroscopic Ellipsometry I
Presenter: J.A. Woollam, J.A. Woollam Company, Inc.
Authors: J.A. Woollam, J.A. Woollam Company, Inc.
J.N. Hilfiker, J.A. Woollam Company Inc.
P. He, J.A. Woollam Company Inc.
Correspondent: Click to Email

Spectroscopic Ellipsometry (SE) has been used for decades for basic research on surfaces and thin films. Hundreds of articles, review papers, and books describe SE use in physics, chemistry and surface and materials engineering. Far less is available describing industrial applications because companies gain competitive advantage using SE and are not motivated to publish.

Without revealing anyone’s proprietary information, this talk reviews examples of SE use in industry. This involves both production quality control (QC), and product development. Best known is SE for QC in integrated circuit manufacturing. Others include integrated circuit critical dimension (CD) metrology, read-write heads, display technologies, optoelectronics, photovoltaics (crystalline and thin film), optical coatings, web-coaters, wear surfaces, and protective coatings. Industrial SE applications include ex-situ, in-situ, and in-line metrology.