| AVS 55th International Symposium & Exhibition | |
| Advanced Surface Engineering | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SE-WeM1 Invited Paper Controlling Plasma Deposition with Liquid Aerosol Precursors L. O'Neill, J.D. Albaugh, Dow Corning, Ireland |
| 8:40am | SE-WeM3 Deposition of Metallic Nanoparticles using Atmospheric Plasma F. Demoisson, Universite Libre de Bruxelles, Belgium, J.J. Pireaux, Facultés Universitaires Notre Dame de la Paix, Belgium, H. Terryn, Vrije Universiteit Brussel, Belgium, F. Reniers, Universite Libre de Bruxelles, Belgium |
| 9:00am | SE-WeM4 Design and Applications of the Atmospheric Pressure Hollow Cathodes H. Baránková, L. Bárdos, Uppsala University, Sweden |
| 9:20am | SE-WeM5 Invited Paper Advanced Atmospheric Pressure Microplasma Sources for Surface Treatment K.-D. Weltmann, R. Brandenburg, R. Foest, E. Kindel, M. Stieber, T.V. Woedtke, Leibniz-Institute for Plasma Science and Technology e.V. (INP Greifswald), Germany |
| 10:40am | SE-WeM9 Invited Paper Stress and Strain in Polycrystalline Thin Films G.C.A.M. Janssen, TU Delft, The Netherlands |
| 11:20am | SE-WeM11 The Location and Effects of Si in Arc-Evaporated (Ti1-xSix)Ny Thin Solid Films A. Flink, M. Beckers, B. Alling, J. Bareno, Linköping University, Sweden, J. Sjölen, Seco Tools AB, Sweden, I. Abrikosov, L. Hultman, Linköping University, Sweden |
| 11:40am | SE-WeM12 Phase Stabilization in CrN by Addition of Si and O L. Castaldi, EMPA, Switzerland, D. Kurapov, A. Reiter, OC Oerlikon Balzers AG, Switzerland, V. Shklover, ETH Zurich, Switzerland, J. Patscheider, EMPA, Switzerland |