| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | NS+NC-FrM1 Invited Paper Synthesis of Controlled (/n,m/) Identity Single-Walled Carbon Nanotubes L. Pfefferle, C. Zoican, Yale University |
| 9:00am | NS+NC-FrM3 Fullerene Growth on N-adsorbed Cu(001) Nanopatterned Surfaces T. Iimori, B. Lu, University of Tokyo, Japan, K. Sakamoto, Chiba University, Japan, K. Nakatsuji, University of Tokyo, Japan, F. Rosei, University of Quebec, Canada, F. Komori, University of Tokyo, Japan |
| 9:20am | NS+NC-FrM4 Nanochemical Equilibrium Involving a Small Number of Molecules: a Prediction of a Distinct Confinement Effect M. Polak, L. Rubinovich, Ben-Gurion University, Israel |
| 9:40am | NS+NC-FrM5 Epitaxial Growth of InP Nanowires on Silicon L. Gao, R.L. Woo, R.F. Hicks, University of California, Los Angeles |
| 10:00am | NS+NC-FrM6 Structure and Electron Transport within Self-Assembled Monolayers (SAMs) of Discotic Molecules on Au-substrates A. Bashir, Ruhr Universität Bochum, Germany, X. Dou, Max Plank Institute of Polymer Research Mainz, Germany, Z. Wang, D. Käfer, G. Witte, Ruhr Universität Bochum, Germany, K. Müllen, Max Plank Institute of Polymer Research Mainz, Germany, Ch. Wöll, Ruhr Universität Bochum, Germany |
| 10:20am | NS+NC-FrM7 Nanoscale Ballistic Heat Conduction in Silicon L.J. Klein, IBM TJ Watson Research Center, M. Ashegi, Stanford University, H.F. Hamann, IBM TJ Watson Research Center |
| 10:40am | NS+NC-FrM8 Understanding the Factors Driving Performance and Reproducibility for Spray-Coated Single Wall Carbon Nanotube Transparent Conductive Films R.C. Tenent, J.L. Blackburn, T.M. Barnes, M.J. Heben, National Renewable Energy Laboratory |
| 11:00am | NS+NC-FrM9 Electron Beam Irradiation Induced Mass Transport in Indium Filled Indium Oxide Tubular Nanoarrow Structures M. Kumar, V. Singh, B.R. Mehta, J.P. Singh, Indian Institute of Technology Delhi |
| 11:20am | NS+NC-FrM10 Etch Stop Control and Low-Damage Atomic-Layer Etching of HfO22 using BCl3 and Ar Neutral Beam J.B. Park, S.D. Park, W.S. Lim, G.Y. Yeom, SungKyunkwan University, Korea |
| 11:40am | NS+NC-FrM11 Assessment and Characterization of Exposures to Airborne Nanoparticles at Research Centers S.J. Tsai, E. Ada, University of Massachusetts Lowell, J. Isaacs, Northeastern University, M. Ellenbecker, University of Massachusetts Lowell |