| AVS 55th International Symposium & Exhibition | |
| Applied Surface Science | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | AS-WeA1 Invited Paper Ambient Surface Mass Spectrometry – DESI – Towards a Metrological Framework F.M. Green, National Physical Laboratory, UK, P. Stokes, G. O'Connor, LGC Ltd., UK, I.S. Gilmore, National Physical Laboratory, UK |
| 2:20pm | AS-WeA3 Shallow-Depth Surface Etching by Electrospray Droplet Impact K. Hiraoka, Y. Sakai, D. Asakawa, University of Yamanashi, Japan, Y. Iijima, JEOL Ltd. |
| 2:40pm | AS-WeA4 Application of TOF-SIMS and LEIS for the Characterization of Ultra-Thin Films T. Grehl, D. Rading, E. Niehuis, ION-TOF GmbH, Germany, R. ter Veen, H. Brongersma, Calipso BV, The Netherlands, M. Fartmann, B. Hagenhoff, TASCON GmbH, Germany |
| 3:00pm | AS-WeA5 Use of Ion-Solid Interaction Theory to Optimize FIB Processes L.A. Giannuzzi, FEI Company |
| 4:00pm | AS-WeA8 C60 Bombardment of Si - New Insights from SIMS and TEM G. Gillen, C. Szakal, A. Herzing, I. Anderson, National Institute of Standards and Technology, S. Hues, Micron Technology, J. Bennett, Process Characterization Laboratories, ATDF |
| 4:20pm | AS-WeA9 Understanding the Relationship between Chemical Vapor Deposition Precursor Structure and Film Properties by Application of Electron, Optical, Ion, and X-ray Characterization Methods B.W. Schmidt, B.R. Rogers, R.D. Geil, Vanderbilt University |
| 4:40pm | AS-WeA10 The Interface Formation between Calcium and Poly(3-hexylthiophene) Investigated with Adsorption Microcalorimetry, High-Resolution XPS and ISS F. Bebensee, Universitaet Erlangen, Germany, J.F. Zhu, University of Science and Technology of China, J.H. Baricuatro, J.A. Farmer, W. Lew, University of Washington, H.-P. Steinrueck, J.M. Gottfried, Universitaet Erlangen, Germany, C.T. Campbell, University of Washington |
| 5:00pm | AS-WeA11 Synthesis and Characterization of Core/Shell Nanoparticle Thin Films for Gas Analytical Microdevices M. Bruns, M. Fuchs, R. Ochs, S. Schlabach, D.V. Szabó, Forschungszentrum Karlsruhe GmbH, Germany, T. Grehl, S. Kayser, ION-TOF GmbH, Germany, M. Fartmann, Tascon GmbH, Germany |
| 5:20pm | AS-WeA12 Molecular Depth Profiling for Soft Materials by using Size-Selected Large Cluster Ions J. Matsuo, S. Ninomiya, H. Yamada, K. Ichiki, Y. Nakata, T. Aoki, T. Seki, Kyoto University, Japan |