| AVS 55th International Symposium & Exhibition | |
| Tribology Focus Topic | Thursday Sessions |
| Session TR+SE+TF-ThM |
| Session: | Advances in Surface Engineering for Friction and Wear Control |
| Presenter: | J.E. Krzanowski, University of New Hampshire |
| Authors: | J.E. Krzanowski, University of New Hampshire M. Nowicki, University of New Hampshire |
| Correspondent: | Click to Email |
Titanium nitride and indium have both found applications as tribological coatings. While TiN is used primarily for its high hardness and wear resistance, indium can be used as a solid lubricant layer. In this study, we have examined the concept of using co-deposited TiN-In films for tribological applications. Ti-In-N films have been deposited by RF co-sputtering of Ti and In in a nitrogen/argon atmosphere. By varying the power to the Ti and In sources, the In/Ti ratio in the film was varied. Films were deposited at DC substrate bias levels of -50V and -150V. In both cases, as the In/Ti power ratio was increased, the indium content increased, but in a highly non-linear manner. At lower power ratios, the films had a cubic TiN structure, but as the power ratio increased, there was an abrupt transition to a hexagonal structure. Near the transition point, the films could also be amorphous, depending on film thickness, and thicker films were more likely to be crystalline. Below the transition point, the film composition depended strongly on substrate bias, and films deposited at -150V bias exhibited significantly reduced indium contents. Tribolgical tests were conducted using a pin-on-disk test with an alumina counterface. Most films showed shorter wear lives compared to TiN alone. The friction coefficients were found to depend on the In content in the films, and it was also found that heating films for short times in the range of 100-250C reduced friction coefficients.