AVS 55th International Symposium & Exhibition
    Thin Film Monday Sessions
       Session TF+NC-MoM

Invited Paper TF+NC-MoM1
Interfacial Organic Layers: Tailored Nucleation and Growth of Inorganic Thin Films for Applications in Molecular Electronics and Barrier Layers

Monday, October 20, 2008, 8:20 am, Room 302

Session: ALD of Hybrid Materials and ALD on 3D Nanostructures
Presenter: J.R. Engstrom, Cornell University
Correspondent: Click to Email

Interfacial organic layers, including self-assembled monolayers, have long been recognized for their potential to modify the chemical and physical properties of surfaces. One particularly exciting concept is to use interfacial organic layers to promote thin film deposition of inorganic materials, particularly in situations where nucleation is problematic. Another interesting concept involves making use of the organic layer itself as an active component in molecular-based electronics. Here, a challenge is to make electrical (top) contact with the organic layer, whilst not degrading its properties, nor forming electrical shorts due to penetration of the organic layer. Key to the realization of both of these concepts is developing an understanding of the interactions between thin film precursors, and interfacial organic layers possessing a variety of terminal organic functional groups and also microstructures. In this talk we will summarize our work in this area concerning: (i) the formation of the interfacial organic layers and their characterization; (ii) the reactions of these layers with Ti- and Ta-amido coordination complexes; and (iii) the formation of inorganic thin films on these layers using atomic layer deposition. Here we make use of supersonic molecular beam scattering techniques, atomic force microscopy, scanning transmission electron microscopy, and x-ray photoelectron spectroscopy. We will find that (undesired) penetration of the organic layers by the coordination complexes can be avoided and/or minimized by proper design of the organic layer. Concerning growth on the layers using atomic layer deposition, we find that the chemical termination and microstucture of the organic layers play an important role in terms of the kinetics of nucleation and growth, and the evolution of thin film morphology.