Paper SE-ThP16
High Power Pulse Plasma Generator for Material Processing

Thursday, October 23, 2008, 6:00 pm, Room Hall D

High Power pulse Plasma Generator for Material Processing. Roman Chistyakov1,2, Bassam Abraham1,2 Zond, Inc1/Zpulser2, LLC, 137A/137 B High Street, Mansfield, MA 02048, A new high power pulse plasma generator was developed. This plasma generator can generate negative arbitrary voltage pulse shapes in the range 200 – 1500 microsecond in wide range of output power. By applying these pulses to the sputtering magnetron arbitrary pulse power magnetron discharge can be produce. The typical arbitrary voltage pulse shape for magnetron sputtering consists from two stages. The first stage is a low power discharge and the second stage is a high power discharge. The presence of two power stages in one pulse reduces the probability to have arc and increases ionization of sputtered material. High power pulse plasma generator is a switching power supply. User friendly software enables full control of the switching device. This plasma generator was successfully used for different sputtering applications including reactive and non reactive processes. The principals of building arbitrary voltage pulse shapes will be discussed. The examples of different voltage pulse shapes for different sputtering conditions will be presented.